WebAug 1, 2005 · Metrology Comparisons between EUV at-wavelength metrological methods DOI: 10.1117/12.616676 Authors: Katsumi Sugisaki Masashi Okada Yucong Zhu Nikon Instruments Katsura Otaki Show all 12... WebOct 29, 2004 · Abstract:The high-accuracy wavefront metrology at wavelength is a key technology for assembling EWV projection optics, In EUVA, we have been developing the EUV Wavefront Metrology System (EWMS), which is an interferometer for a high NA, 6-mirror projection system.

Advances of EUV interferometry in EUVA IEEE Conference Publica…

WebWe are developing an at-wavelength interferometer for EUV lithography systems. The goal is the measurement of the wavefront aberration for a six-aspherical mirror projection optic. Among the... WebMay 20, 2004 · An Experimental extreme ultraviolet (EUV) interferometer (EEI) using an undulator as a light source was installed in New SUBARU synchrotron facility at Himeji Institute of Technology (HIT). The EEI can evaluate the five metrology methods reported before. (1) A purpose of the EEI is to determine the most suitable method for measuring … dave ramsey childhood

Recent progress of EUV wavefront metrology in EUVA

WebIntroduction Extreme ultraviolet (EUV, λ =13.5 nm) lithography is expected as the next generation lithography to the ArF immersion lithograph ( λ =193 nm ). Projection optics is … WebOct 18, 2004 · The recent experimental results of EUV wavefront metrology in EUVA are reported. EUV Experimental Interferometer (EEI) was built at the NewSUBARU … WebMar 21, 2008 · The wavefront measurements have been performed with the EUV Wavefront Metrology System (EWMS) for the first time using a prototype projection optic as a test optic. The wavefronts of the test optic was measured at the five positions in the exposure field with the Digital Talbot Interferometer (DTI). The RMS magnitude of the … dave ramsey children\u0027s bank